Dr. Joel Seligson
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 14 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Metrology, Optical lithography, Detection and tracking algorithms, Imaging systems, Sensors, Image processing, Spectroscopy, Scatterometry, Overlay metrology

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, MATLAB, Image processing, Computer simulations, Signal processing, Photoresist processing, Semiconducting wafers, Performance modeling, Overlay metrology, Device simulation

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Metals, Scanners, Copper, Diagnostics, Aluminum, Semiconducting wafers, Overlay metrology, Back end of line

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Wafer-level optics, Diffraction, Metrology, Silicon, Optical testing, Monte Carlo methods, Semiconducting wafers, Electromagnetism, Overlay metrology, Standards development

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Metrology, Metals, Tungsten, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top