Dr. Joern-Holger Franke
at imec
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 4 January 2021 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Metrology, Optical lithography, Etching, Scanners, Ecosystems, Image quality, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Deep ultraviolet, Scanners, Manufacturing, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Showing 5 of 15 publications
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