Johan O. Karlsson
at Micronic Laser Systems AB
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Diffractive optical elements, Deep ultraviolet, Etching, Photomasks, Critical dimension metrology, Photoresist processing, Binary data, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Deep ultraviolet, Diffusion, Manufacturing, Control systems, Photomasks, Critical dimension metrology, Photoresist processing, Temperature metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Diffractive optical elements, Deep ultraviolet, Etching, Dry etching, Manufacturing, Image resolution, Photomasks, Reactive ion etching, Photoresist processing

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Deep ultraviolet, Image processing, Manufacturing, Laser applications, Printing, Spatial light modulators, Solids, Photomasks, Raster graphics

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Diffraction, Refractive index, Diffractive optical elements, Quartz, Manufacturing, Phase shift keying, Spatial light modulators, Photomasks, Stray light, Optics manufacturing

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Deep ultraviolet, Polymers, Diffusion, Chemistry, Printing, Photoresist materials, Spatial light modulators, Photomasks, Critical dimension metrology, Chemically amplified resists

Showing 5 of 8 publications
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