Dr. Johann Foucher
CEO
SPIE Involvement:
Author
Area of Expertise:
nanometrology , nanotechnologies , semiconductor industry , plasma physics , start-up , business development
Websites:
Publications (39)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metrology, Detection and tracking algorithms, Image processing, Image analysis, Neural networks, Line width roughness, Machine learning, Image enhancement, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | March 16, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Cognitive modeling, Detection and tracking algorithms, Data modeling, Databases, Image segmentation, Image processing, Inspection, Image filtering, Machine learning

PROCEEDINGS ARTICLE | April 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Nanotechnology, Metrology, Crystals, Chemistry, Process control, Atmospheric modeling, Process modeling, Industrial chemicals, Data fusion

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Nanostructures, Edge detection, Metrology, Databases, Image processing, Transmission electron microscopy, Process control, Very large scale integration, Machine learning, Analytical research, Critical dimension metrology, Line edge roughness, Algorithm development, Carbon nanotubes

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Data modeling, Image processing, Image analysis, Scanning electron microscopy, Process control, Software development, Algorithm development, Data analysis

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Neck, Metrology, Image processing, Silicon, Image analysis, Atomic force microscopy, Scanning electron microscopy, Process control, Critical dimension metrology, Algorithm development

Showing 5 of 39 publications
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