Dr. Johann Foucher
CEO
SPIE Involvement:
Author
Area of Expertise:
nanometrology , nanotechnologies , semiconductor industry , plasma physics , start-up , business development
Websites:
Publications (41)

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Machine learning, Image processing, Data modeling, Process engineering, Data analysis, Image analysis, Process modeling, Line edge roughness, Metrology, Engineering education

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Machine learning, Databases, Image processing, Plasma etching, Process engineering, Data analysis, Image analysis, Transmission electron microscopy, Scanning electron microscopy, Semiconductors

Proceedings Article | 19 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Machine learning, Image processing, Neural networks, Line edge roughness, Image analysis, Line width roughness, Critical dimension metrology, Image enhancement, Detection and tracking algorithms, Metrology

Proceedings Article | 16 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Machine learning, Image processing, Cognitive modeling, Data modeling, Image filtering, Databases, Detection and tracking algorithms, Metrology, Inspection, Image segmentation

Proceedings Article | 28 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Data fusion, Process control, Atmospheric modeling, Nanotechnology, Chemistry, Semiconductors, Process modeling, Crystals, Industrial chemicals

Showing 5 of 41 publications
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