Dr. Johann Foucher
CEO
SPIE Involvement:
Author
Area of Expertise:
nanometrology , nanotechnologies , semiconductor industry , plasma physics , start-up , business development
Websites:
Publications (44)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Image processing, Scanning electron microscopy, 3D metrology, Machine vision, Machine learning, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, 3D image processing

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Semiconductors, Microscopes, Metrology, Databases, Image processing, Manufacturing, Transmission electron microscopy, Machine learning, Algorithm development, Process engineering

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Semiconductors, Image processing, Computer simulations, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Machine learning, 3D image processing, Process engineering

Proceedings Article | 25 March 2019 Presentation + Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Metrology, Data modeling, Image processing, Image analysis, Machine learning, Line edge roughness, Process modeling, Engineering education, Process engineering, Data analysis

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Semiconductors, Databases, Image processing, Image analysis, Scanning electron microscopy, Transmission electron microscopy, Machine learning, Plasma etching, Process engineering, Data analysis

Showing 5 of 44 publications
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