Dr. Johannes Plauth
Field Application Engineer at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scanners, Wavefronts, Distortion, Semiconducting wafers, Yield improvement, Overlay metrology, Device simulation

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Oxides, Avalanche photodetectors, Metals, Tungsten, Data transmission, Aluminum, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

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