Dr. Johannes Ruoff
Optical Designer at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (15)

SPIE Journal Paper | October 4, 2018
OE Vol. 57 Issue 10
KEYWORDS: Wavefronts, Optical design, Optical engineering, Error analysis, Zernike polynomials, Ray tracing, Statistical analysis, Vignetting, Visualization, Light emitting diodes

PROCEEDINGS ARTICLE | November 27, 2017
Proc. SPIE. 10590, International Optical Design Conference 2017

PROCEEDINGS ARTICLE | September 27, 2016
Proc. SPIE. 9953, Optical Modeling and Performance Predictions VIII
KEYWORDS: Diffraction, Refractive index, Diffractive optical elements, Computer generated holography, Refraction, Far-field diffraction, Far-field diffraction, Ray tracing, Geometrical optics, Optical design software, Diffraction gratings

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Multilayers, Silicon, Photomasks, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Molybdenum, Binary data, Image quality standards

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Diffraction, Apodization, Refractive index, Reticles, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Bismuth, Critical dimension metrology

Showing 5 of 15 publications
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