Dr. Johannes Ruoff
Optical Designer at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (15)

SPIE Journal Paper | 4 October 2018
OE Vol. 57 Issue 10
KEYWORDS: Wavefronts, Optical design, Optical engineering, Error analysis, Zernike polynomials, Ray tracing, Statistical analysis, Vignetting, Visualization, Light emitting diodes

Proceedings Article | 27 November 2017 Paper
Proc. SPIE. 10590, International Optical Design Conference 2017

Proceedings Article | 27 September 2016 Paper
Proc. SPIE. 9953, Optical Modeling and Performance Predictions VIII
KEYWORDS: Diffraction, Refractive index, Diffractive optical elements, Computer generated holography, Refraction, Far-field diffraction, Far-field diffraction, Ray tracing, Geometrical optics, Optical design software, Diffraction gratings

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Multilayers, Silicon, Photomasks, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Molybdenum, Binary data, Image quality standards

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Showing 5 of 15 publications
Conference Committee Involvement (2)
Modeling Aspects in Optical Metrology VIII
21 June 2021 | Online Only, Germany
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
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