Dr. Johannes van Wingerden
at Technische Univ Delft
SPIE Involvement:
Publications (11)

Proceedings Article | 14 March 2006 Paper
Johannes van Wingerden, Laurent Le Cam, Rene Wientjes, Michael Benndorf, Yorick Trouiller, Jerome Belledent, Rob Morton, Yuri Aksenov
Proceedings Volume 6156, 61560O (2006) https://doi.org/10.1117/12.656359
KEYWORDS: Critical dimension metrology, Lithography, Logic, Scanners, Semiconductors, Transistors, Design for manufacturing, Group IV semiconductors, Optical proximity correction, Process control

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599648
KEYWORDS: Photomasks, Critical dimension metrology, Manufacturing, Semiconducting wafers, Design for manufacturing, Image processing, Electroluminescence, Lithography, Data modeling, Scanners

SPIE Journal Paper | 1 April 2004
JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669524
KEYWORDS: Photomasks, Printing, Critical dimension metrology, Lithography, Phase shifts, Optical lithography, Metals, Nanoimprint lithography, Semiconducting wafers, Image transmission

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518022
KEYWORDS: Photomasks, Inspection, Printing, Reticles, Critical dimension metrology, Optical lithography, Manufacturing, Metals, 193nm lithography, Nanoimprint lithography

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485520
KEYWORDS: Critical dimension metrology, Photomasks, Image processing, Monte Carlo methods, Semiconducting wafers, Electroluminescence, Process control, Optical proximity correction, Lithography, Statistical analysis

Showing 5 of 11 publications
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