Dr. Johannes van Wingerden
at NXP Semiconductors
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Logic, Scanners, Process control, Design for manufacturing, Transistors, Optical proximity correction, Critical dimension metrology, Group IV semiconductors

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Data modeling, Image processing, Scanners, Manufacturing, Electroluminescence, Design for manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 1 April 2004
JM3 Vol. 3 Issue 02
KEYWORDS: Photomasks, Printing, Critical dimension metrology, Lithography, Phase shifts, Optical lithography, Metals, Nanoimprint lithography, Semiconducting wafers, Image transmission

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Metals, Manufacturing, Inspection, Printing, Photomasks, Nanoimprint lithography, Critical dimension metrology, 193nm lithography

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Statistical analysis, Image processing, Electroluminescence, Monte Carlo methods, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 11 publications
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