Dr. John A. Allgair
3D/2.5D Program Manager at
SPIE Involvement:
Conference Program Committee | Conference Co-Chair | Conference Chair | Author | Editor
Publications (59)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Semiconducting wafers, Critical dimension metrology, Transmission electron microscopy, Etching, Process control, Reactive ion etching, Data modeling, High volume manufacturing

SPIE Journal Paper | June 5, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Photoresist materials, Metrology, Critical dimension metrology, Time metrology, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Diffractive optical elements, Optical proximity correction

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Line edge roughness, Scatterometry, Data modeling, Metrology, Critical dimension metrology, Metals, Semiconducting wafers, Extreme ultraviolet, Scatter measurement

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Photoresist materials, Metrology, Semiconducting wafers, Lithography, Critical dimension metrology, Time metrology, Etching, Optical proximity correction, Manufacturing, Polymers

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Critical dimension metrology, Scatterometry, Semiconducting wafers, Metals, Transmission electron microscopy, Data modeling, Atomic force microscopy, Inspection

Showing 5 of 59 publications
Conference Committee Involvement (19)
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVII
25 February 2013 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVI
13 February 2012 | San Jose, California, United States
Showing 5 of 19 published special sections
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