Dr. John A. Allgair
Program Manager at BRIDG
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (51)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Etching, Transmission electron microscopy, Process control, High volume manufacturing, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

SPIE Journal Paper | 5 June 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Photoresist materials, Metrology, Critical dimension metrology, Time metrology, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Diffractive optical elements, Optical proximity correction

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Metals, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Scatter measurement

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Etching, Polymers, Manufacturing, Photoresist materials, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 51 publications
Proceedings Volume Editor (8)

Showing 5 of 8 publications
Conference Committee Involvement (19)
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVII
25 February 2013 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVI
13 February 2012 | San Jose, California, United States
Showing 5 of 19 Conference Committees
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