Dr. John H. Bruning Profile

Dr. John H. Bruning

Retired

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 27 March 2007 Paper

Optical lithography: 40 years and holding

John Bruning

Proceedings Volume 6520, 652004 (2007) https://doi.org/10.1117/12.720631

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Optical lithography, Printing, Cameras, Reticles, Mirrors, Imaging systems, Lens design

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Proceedings Article | 4 November 2003 Paper

Surface characterization of optically polished CaF2 crystal by quasi-Brewster-angle technique

Jue Wang, Robert Maier, John Bruning

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.507180

KEYWORDS: Surface finishing, Contamination, Polishing, Refractive index, Radium, Surface roughness, Crystal optics, Crystals, Excimer lasers, Atomic force microscopy

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SPIE Journal Paper | 1 October 2002

Symmetry of spatial-dispersion-induced birefringence and its implications for CaF₂ ultraviolet optics

John Burnett, Zachary Levine, Eric Shirley, John Bruning

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1503350

KEYWORDS: Birefringence, Crystals, Anisotropy, Polarization, Dielectrics, Wave propagation, Lithography, Ultraviolet radiation, UV optics, Refraction

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Proceedings Article | 7 July 1997 Paper

Optical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools

John Bruning

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275782

KEYWORDS: Semiconducting wafers, Photomasks, Printing, Lenses, Optical lithography, Lithography, Imaging systems, Mirrors, Lens design, Optical design

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Proceedings Article | 7 July 1997 Paper

Optical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools

John Bruning

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275825

KEYWORDS: Semiconducting wafers, Photomasks, Printing, Lenses, Lithography, Optical lithography, Imaging systems, Mirrors, Lens design, Optical design

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Proceedings Article | 7 July 1997 Paper

Optical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools

John Bruning

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275983

KEYWORDS: Optical lithography, Printing, Semiconducting wafers, Imaging systems, Integrated circuits, Mirrors, Photomasks, Lithography

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Proceedings Article | 7 July 1997 Paper

0ptical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools

John Bruning

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275920

KEYWORDS: Semiconducting wafers, Photomasks, Printing, Lenses, Optical lithography, Lithography, Mirrors, Imaging systems, Lens design, Optical design

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Proceedings Article | 1 May 1990 Paper

20:1 projection soft x-ray lithography using trilevel resist

Tanya Jewell, M. Becker, John Bjorkholm, Jeffrey Bokor, Ludwig Eichner, Richard Freeman, William Mansfield, Alastair MacDowell, M. O'Malley, Eric Raab, William Silfvast, L. Szeto, Donald Tennant, Warren Waskiewicz, Donald White, David Windt, Obert Wood, John Bruning

Proceedings Volume 1263, (1990) https://doi.org/10.1117/12.20173

KEYWORDS: Photomasks, Mirrors, Objectives, X-ray lithography, X-rays, Silicon, X-ray technology, Reflectivity, Imaging systems, Diffraction

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Showing 5 of 8 publications

Conference Committee Involvement (1)

Optical Sciences

10 April 2001 | Rochester, NY, United States

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