John Duff
Technical Program Manager at
SPIE Involvement:
Author | Instructor
Publications (1)

PROCEEDINGS ARTICLE | April 23, 1999
Proc. SPIE. 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
KEYWORDS: Metrology, Opacity, Calibration, Manufacturing, Control systems, Process control, Photomasks, Critical dimension metrology, Excel, Standards development

Course Instructor
SC579: Photomask Fabrication and Technology Basics
This course provides attendees with a working knowledge of photomask technology. The course focuses on process flow with emphasis in the challenges associated with design data conversions, lithography, process, metrology, inspection, and advanced mask manufacture. Although an entry-level course, the following topics are reviewed in considerable detail: o Design Data conversion tools and conversion strategies o Patterning Technologies (e-beam and laser) and key resolution and write time drivers o Advanced Mask Processing (Bake, Develop, Etch, CAR) o Mask Materials (NTAR, etc.) Other topics such as the application of SPC, signature matching, Phase Shifting Masks, and Imprint Templates will also be covered.
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top