Dr. John E. Goldsmith
Manager of Nanolithography Dept at Sandia National Labs California
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Wavefronts, Scanning electron microscopy, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Reticles, Sensors, Wavefronts, Printing, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Point spread functions, Reticles, Image resolution, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Electrodes, Capillaries, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Thermal modeling, Plasma, Fiber optic illuminators

PROCEEDINGS ARTICLE | December 30, 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Multilayers, Reticles, Inspection, Chromium, Scanning electron microscopy, Printing, Silicon films, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | June 25, 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Lithography, Imaging systems, Cameras, Wavefronts, Photoresist materials, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist developing

Showing 5 of 10 publications
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