Dr. John G. Hartley
Fellow at NuFlare Technology USA
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Metrology, Clocks, Metals, Computer programming, Beam shaping, Double patterning technology, Analog electronics, Photomicroscopy, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Metrology, Metals, Computer programming, Time metrology, Beam shaping, Zone plates, Data conversion, Photomicroscopy, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Metrology, Polymers, Silicon, Finite element methods, Photomasks, Extreme ultraviolet, Line width roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Reticles, Backscatter, Silicon, Monte Carlo methods, Extreme ultraviolet, Computed tomography, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Electron beam lithography, Reticles, Metals, Nickel, Silicon, Reflectivity, Photomasks, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Capillaries, Glasses, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 19 publications
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