Dr. John G. Hartley
Fellow at NuFlare Technology USA
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Metrology, Clocks, Metals, Computer programming, Beam shaping, Double patterning technology, Analog electronics, Photomicroscopy, Semiconducting wafers

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Metrology, Metals, Computer programming, Time metrology, Beam shaping, Zone plates, Data conversion, Photomicroscopy, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Metrology, Polymers, Silicon, Finite element methods, Photomasks, Extreme ultraviolet, Line width roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Reticles, Backscatter, Silicon, Monte Carlo methods, Extreme ultraviolet, Computed tomography, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Electron beam lithography, Reticles, Metals, Nickel, Silicon, Reflectivity, Photomasks, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 19 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top