John C. Moore
Director of Product Development at General Chemical Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Safety, Polymers, Metals, Copper, Chemistry, Photoresist materials, Aluminum, Photoresist processing, Semiconducting wafers, Back end of line

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, FT-IR spectroscopy, Statistical analysis, Deep ultraviolet, Chemistry, Photoresist materials, Photoresist processing, Semiconducting wafers, Photoresist developing, Catalysis

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Etching, Polymers, Molecules, Chemistry, Ultrasonics, Photoresist materials, Polymerization, Photoresist processing, Semiconducting wafers, Liquids

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