Dr. John L. Nistler
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 19 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Reticles, Manufacturing, Photomasks, Immersion lithography, Stereolithography, Resolution enhancement technologies

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Databases, Metals, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, Computer aided design, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Error analysis, Monte Carlo methods, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 December 1998
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Reticles, Etching, Photomasks, Transistors, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Plasma

Proceedings Article | 27 August 1997
Proc. SPIE. 3212, Microelectronic Device Technology
KEYWORDS: Oxides, Metals, Manufacturing, Reliability, Printing, Capacitance, Boron, Transistors, CMOS technology, Semiconducting wafers

Showing 5 of 15 publications
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