John T. Nogatch
Principal Research and Development Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Computing systems, Fourier transforms, Parallel processing, Data processing, Software development, Information technology, Photomasks, Integrated circuits, Optical proximity correction, Received signal strength

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Electrodes, Silicon, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Prototyping

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Metrology, Visualization, Error analysis, Data processing, Photomasks, Optical simulations, Critical dimension metrology, Data conversion, Prototyping, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Data storage, Computing systems, Parallel processing, Distributed computing, Photomasks, Optical proximity correction, Computer aided design, Parallel computing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Data modeling, Data storage, Manufacturing, Inspection, Computing systems, Data processing, Photomasks, Explosives, Beam shaping, Data conversion

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Roads, Image processing, Data processing, Photomasks, Computed tomography, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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