Dr. John N. Randall
Vice President at Zyvex Corp
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 13, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Nanotechnology, Electron beam lithography, Optical lithography, Germanium, Silicon, Manufacturing, Transistors, Nanolithography, Focus stacking software

PROCEEDINGS ARTICLE | January 22, 2005
Proc. SPIE. 5716, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS IV
KEYWORDS: Microelectromechanical systems, Lithography, Manufacturing, 3D modeling, Scanning electron microscopy, Autocollimators, Modal analysis, Finite element methods, Connectors, Assembly tolerances

PROCEEDINGS ARTICLE | July 10, 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Reticles, Silicon, Scanning electron microscopy, Photomasks, Transistors, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Databases, Etching, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Reticles, Optical lithography, Cadmium, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Electroluminescence, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Showing 5 of 13 publications
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