Dr. John C. Robinson
Senior Principal Scientist
SPIE Involvement:
Conference Co-Chair | Editor | Author
Area of Expertise:
Metrology , Process Control , Physics , Inspection , Semiconductor Manufacturing , LED
Publications (46)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Semiconductors, Reliability, Inspection, Semiconducting wafers, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Metrology, Diffractive optical elements, Imaging systems, Manufacturing, Quality measurement, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 30 November 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Stochastic processes, Optical lithography, Integrated circuits, Line edge roughness, Extreme ultraviolet lithography, Line width roughness, Metrology, Critical dimension metrology, Photomasks, Semiconducting wafers

Proceedings Article | 27 April 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Optical imaging, Metrology, Diffractive optical elements, Etching, Optical metrology, Process control, Semiconducting wafers, Overlay metrology, Model-based design, Process modeling

Showing 5 of 46 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (11)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
21 February 2021 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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