Dr. John C. Robinson
Director at KLA Corporation
SPIE Involvement:
Senior status | Conference Program Committee | Author
Area of Expertise:
Metrology , Process Control , Physics , Inspection , Semiconductor Manufacturing , LED
Publications (44)

SPIE Journal Paper | November 30, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Stochastic processes, Optical lithography, Integrated circuits, Line edge roughness, Extreme ultraviolet lithography, Line width roughness, Metrology, Critical dimension metrology, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | April 27, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Optical imaging, Metrology, Diffractive optical elements, Etching, Optical metrology, Process control, Semiconducting wafers, Overlay metrology, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Metrology, Modulation, Scanners, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Data modeling, Scanners, Inspection, Control systems, Scanning electron microscopy, Optical inspection, Process control, Semiconductor manufacturing, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Metrology, Optical lithography, Principal component analysis, Seaborgium, Manufacturing, Inspection, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Tolerancing, Overlay metrology

Showing 5 of 44 publications
Conference Committee Involvement (9)
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 9 published special sections
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