Dr. John Scanlan
Chief Technologist at Straatum Processware Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 May 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Signal to noise ratio, Digital signal processing, Sensors, Etching, Signal processing, Process control, Plasma etching, Semiconducting wafers, Sensor technology, Plasma

Proceedings Article | 1 July 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Data modeling, Phase modulation, Sensors, Etching, Process control, Semiconducting wafers, Statistical modeling, Process modeling, Library classification systems, Plasma

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