Dr. John R. Sporre
Manager of Unit Process Engineering-Patterning at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Publications (16)

Proceedings Article | 4 May 2020 Presentation + Paper
Proceedings Volume 11325, 113251I (2020) https://doi.org/10.1117/12.2551498
KEYWORDS: Scatterometry, Machine learning, Semiconducting wafers, Critical dimension metrology, Etching, Photoresist materials, Lithography, Metrology, Scatter measurement, Data modeling

Proceedings Article | 21 March 2017 Paper
Derren Dunn, John Sporre, Vaibhav Deshpande, Mohamed Oulmane, Ronald Gull, Peter Ventzek, Alok Ranjan
Proceedings Volume 10149, 101490Q (2017) https://doi.org/10.1117/12.2271389
KEYWORDS: Etching, Process modeling, Ions, Image processing, Oxides, Monte Carlo methods, 3D modeling, Plasma etching, Chemical elements, Interfaces, Optical lithography, Plasma, Bromine, Semiconducting wafers

SPIE Journal Paper | 5 February 2016
John Sporre, Daniel Elg, Kishor Kalathiparambil, David Ruzic
JM3, Vol. 15, Issue 01, 013503, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013503
KEYWORDS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates

SPIE Journal Paper | 9 February 2015
Daniel Elg, John Sporre, Davide Curreli, Ivan Shchelkanov, David Ruzic, Karl Umstadter
JM3, Vol. 14, Issue 01, 013506, (February 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.013506
KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

Proceedings Article | 8 April 2013 Paper
Proceedings Volume 8679, 86792H (2013) https://doi.org/10.1117/12.2012584
KEYWORDS: Tin, Plasma, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Carbon, Methane

Showing 5 of 16 publications
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