John R. Sporre
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Publications (15)

Proceedings Article | 21 March 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Etching, Image processing, Interfaces, Ions, 3D modeling, Monte Carlo methods, Plasma etching, Chemical elements, Semiconducting wafers, Bromine, Process modeling, Plasma

SPIE Journal Paper | 5 February 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates

SPIE Journal Paper | 9 February 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

Proceedings Article | 8 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Methane, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Plasma, Tin

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, MATLAB, Argon, Particles, Error analysis, Ions, Manufacturing, Magnetism, Extreme ultraviolet, Plasma

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Scattering, Sensors, Argon, Chemical species, Electrodes, Ions, Extreme ultraviolet, Neon, Plasma, Tin

Showing 5 of 15 publications
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