Dr. John R. Sporre
Manager of Unit Process Engineering-Patterning at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Scatterometry, Machine learning, Semiconducting wafers, Critical dimension metrology, Etching, Photoresist materials, Lithography, Metrology, Scatter measurement, Data modeling

Proceedings Article | 21 March 2017 Paper
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Etching, Process modeling, Ions, Image processing, Oxides, Monte Carlo methods, 3D modeling, Plasma etching, Chemical elements, Interfaces, Optical lithography, Plasma, Bromine, Semiconducting wafers

SPIE Journal Paper | 5 February 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates

SPIE Journal Paper | 9 February 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

Proceedings Article | 8 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Tin, Plasma, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Carbon, Methane

Showing 5 of 16 publications
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