Dr. John D. Stuber Profile

Dr. John D. Stuber

Member Group Techn Staff at Texas Instruments Inc

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Publications (1)

Proceedings Article | 1 July 2003 Paper

Multiloop photolithography control using hierarchical context information for APC models

John Stuber

Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485309

KEYWORDS: Reticles, Optical alignment, Control systems, Process control, Overlay metrology, Manufacturing, Data modeling, Critical dimension metrology, Semiconductor manufacturing, Optical lithography

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