Dr. John L. Sturtevant
Director of Product Development at D2S
SPIE Involvement:
Author | Editor | Instructor
Publications (92)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Statistical analysis, Data modeling, Calibration, Photons, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Photons, Printing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF, Line edge roughness, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Databases, Metals, Scanners, Inspection, Computer simulations, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 2 January 2019
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Showing 5 of 92 publications
Proceedings Volume Editor (7)

Showing 5 of 7 publications
Conference Committee Involvement (18)
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability VIII
26 February 2014 | San Jose, California, United States
Showing 5 of 18 Conference Committees
Course Instructor
SC121: Practical Process Design for Microlithography
The microlithography process is critical to the successful manufacture of integrated circuits. Control of the critical dimension (CD) of the device is paramount to producing devices that meet design specification. Eight critical process categories that control feature size are considered. This course looks at each category and discusses the impact that parameter variation has on the lithography process, on device yield and on final device performance. Emphasis is placed on the chemical and physical relationships within the lithography process.This course will consider lithography methods and process tuning appropriate for production lithography now that production is moving below historical limits.This is an excellent opportunity to get advice and specific direction on resist processing.
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