John R. Swyers
District Sales Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanners, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, 193nm lithography

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Calibration, Scanners, Scanning electron microscopy, Photoresist materials, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Calibration, Etching, Scanning electron microscopy, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Cadmium, Calibration, Etching, Error analysis, Scanning electron microscopy, Process control, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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