Johnson Chang-Cheng Hung
Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Calibration, Manufacturing, Inspection, Image transmission, Photomasks, SRAF, Defect inspection

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithium, Imaging systems, Inspection, Optical proximity correction, Heads up displays, Airborne remote sensing

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Vestigial sideband modulation, Defect inspection

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Defect detection, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Airborne remote sensing

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Detection and tracking algorithms, Image segmentation, Image processing, Manufacturing, Inspection, Feature extraction, Solids, Photomasks, Optical proximity correction, Library classification systems

Conference Committee Involvement (4)
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
Photomask Technology
9 September 2003 | Monterey, California, United States
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