Dr. Jon W. Heyl
President at Controlled Semiconductor Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Metrology, Femtosecond phenomena, Deep ultraviolet, Laser processing, Laser development, Inspection, Chemical vapor deposition, Objectives, Photomasks, Computer aided design

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Femtosecond phenomena, Deep ultraviolet, Metals, Glasses, Laser development, Chemical vapor deposition, Computer programming, Laser ablation, Objectives, Photomasks

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