Jonas Hellgren
at Micronic Laser Systems AB
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Data modeling, Deep ultraviolet, Printing, Spatial light modulators, Photomasks, Convolution, Raster graphics, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Data modeling, Deep ultraviolet, Etching, Printing, Spatial light modulators, Photomasks, Plasma etching, Convolution, Raster graphics, Critical dimension metrology

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Mirrors, Deep ultraviolet, Manufacturing, Spatial light modulators, Solids, Photomasks, Optical simulations, Image enhancement, Optical proximity correction, Raster graphics

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top