Dr. Jonathan L. P. Barreaux
PhD Candidate at Univ of Twente
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Publications (1)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Diffraction, Multilayers, Reflection, Imaging systems, Ultraviolet radiation, Silicon, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

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