Plasma based radiation sources optimized to emit 13.5 nm Extreme UV radiation also produce a significant amount of
light at longer wavelengths. This so called out-of-band (OoB) radiation is detrimental for the imaging capabilities of an
EUV lithographic imaging system, particularly the ultraviolet (UV) parts of the light (λ=100-400 nm).
To suppress these wavelengths while maintaining the high efficiency of the mirror for EUV light, several methods
have been developed, including phase-shift gratings (PsG) and anti-reflection layers (SPE layer). Both methods have
achieved a suppression factor of 10 - 30 around the target wavelength. To achieve a full band suppression effect with a
minimum loss of EUV light, a new scheme based on surface pyramid structures was developed. An average suppression
of more than 10 times was achieved with a relative EUV efficiency of 82.2% by using the Si pyramids structure
(compared to a flat multilayer (ML)). Recently, we have successfully produced a pyramid structure consisting of
multilayers which greatly improves the relative EUV efficiency to 94.2%.