Dr. Jonathan L. Cobb
at Synopsys Inc
SPIE Involvement:
Author
Publications (35)

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design, 193nm lithography

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Point spread functions, Reticles, Optical lithography, Data modeling, Calibration, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Lithography, Optical lithography, Atrial fibrillation, Lithographic illumination, Manufacturing, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Optical lithography, Error analysis, Manufacturing, Photomasks, Optical proximity correction, SRAF, OLE for process control, Resolution enhancement technologies

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Binary data, 3D image processing

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Critical dimension metrology, Binary data

Showing 5 of 35 publications
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