Dr. Jonathan Ho
Principal Engineer at Xilinx Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Diffusion, Field programmable gate arrays, Lens design, Design for manufacturing, Transistors, Immersion lithography, Critical dimension metrology, Design for manufacturability

PROCEEDINGS ARTICLE | March 4, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Oscillators, Etching, Diffusion, Scanning electron microscopy, Transistors, Optical proximity correction, Semiconducting wafers, Model-based design, Standards development

SPIE Journal Paper | July 1, 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optical calibration, Process modeling

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Diffraction, Metals, Field programmable gate arrays, Scanning electron microscopy, Microelectronics, Design for manufacturing, Optical simulations, Optical proximity correction, Critical dimension metrology, Optics manufacturing

Showing 5 of 9 publications
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