Jonathan Jeauneau
Field Applications Engineering Manager at Brewer Science Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Diffraction, Antireflective coatings, Ultraviolet radiation, Coating, Reflectivity, Electroluminescence, Photoresist materials, Line width roughness, Immersion lithography, Phase shifts

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