Jonathon L. Schad
undergraduate student
SPIE Involvement:
Publications (3)

Proceedings Article | 25 March 2016 Paper
Amrit Narasimhan, Steven Grzeskowiak, Jonathan Ostrander, Jonathon Schad, Eliran Rebeyev, Mark Neisser, Leonidas Ocola, Gregory Denbeaux, Robert Brainard
Proceedings Volume 9779, 97790F (2016)
KEYWORDS: Electrons, Luminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Molecules, Photons, Lithography, Photoresist materials, Ionization, Molecular interactions, Polymers, Photodiodes, Polymethylmethacrylate, Phase modulation, Quantum efficiency

Proceedings Article | 21 March 2016 Paper
Steven Grzeskowiak, Amrit Narasimhan, Liam Wisehart, Jonathon Schad, Mark Neisser, Leonidas Ocola, Robert Brainard, Greg Denbeaux
Proceedings Volume 9779, 97790C (2016)
KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photochemistry, Ionization, Chemically amplified resists, Mass spectrometry, Electron beams, Absorption, Polymers, Molecular interactions

SPIE Journal Paper | 13 October 2015
Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard
JM3, Vol. 14, Issue 04, 043502, (October 2015)
KEYWORDS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling

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