Prof. Jong Rak Park
Professor at Chosun University
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 23 February 2012
OE Vol. 51 Issue 02
KEYWORDS: Photoresist materials, Photoresist developing, Optical components, Absorption, Bragg cells, Device simulation, Photoresist processing, Image processing, Lithography, Optical engineering

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Optical filters, Optical lithography, Etching, Scanners, Coating, Transmittance, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Semiconductors, Optical lithography, Contamination, Cadmium, Quartz, Control systems, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Error analysis, Quantitative analysis, Photomasks, Integrated circuits, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Gaussian beams, Modulation, Electrons, Photomasks, Beam shaping, Raster graphics, Mask making, Critical dimension metrology, Vestigial sideband modulation

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Error analysis, Fourier transforms, Image acquisition, Photomasks, Convolution, Holmium, Semiconducting wafers, Phase shifts

Showing 5 of 7 publications
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