Jong Woo Choi
at Toppan Photomasks Korea Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development, Picture Archiving and Communication System

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Diffractive optical elements, Physics, Photomasks, Critical dimension metrology, Acoustics, Photoresist processing, Semiconducting wafers, Standards development, Temperature metrology

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