Jong-Yuh Chang
Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Holons

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Manufacturing, Inspection, Photomasks, Semiconductor manufacturing, Optical proximity correction, Intelligence systems, Semiconducting wafers

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Defect detection, Sensors, Image processing, Manufacturing, Inspection, Photomasks, Process engineering, Defect inspection

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