Jonggul Doh
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Optical lithography, Modulation, Ecosystems, Data processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Data corrections

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Molybdenum, Stochastic processes, Phase shifts

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Electron beams, Contamination, Data modeling, Calibration, Reliability, Photomasks, Associative arrays, Beam shaping, Vestigial sideband modulation

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Defect inspection

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Chromium, Photomasks, Optical simulations, Absorbance, Semiconducting wafers, Binary data

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top