Jong-hyun Hwang
at Samsung Electronics Co
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Control systems, Scatterometry, Yield improvement, Overlay metrology, Front end of line

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Control systems, Computer simulations, Scanning electron microscopy, Signal processing, Process control, Semiconducting wafers

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Code division multiplexing, Monochromatic aberrations, Sensors, Scanners, Error analysis, Control systems, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers

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