Dr. JongSun Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mathematical modeling, Semiconductors, Lithography, Electronics, Optical lithography, Capillaries, Applied physics, Semiconducting wafers, Liquids, Chemically amplified resists

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Mathematical modeling, Thin films, Lithography, Glasses, Interfaces, Optical proximity correction, Critical dimension metrology, Motion models, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Refractive index, Optical lithography, Image processing, Germanium, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Binary data

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Multilayers, Germanium, Reflectivity, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Absorption

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