Dr. Jongju Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Databases, Inspection, Data processing, Photomasks

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Speckle, Scattering, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Scatter measurement

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