Jongkeun Oh
at samsung electronics
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Etching, Air contamination, Crystals, Ions, Inspection, Photomasks, Chemical analysis, Mask making, Chlorine, Chlorine gas

PROCEEDINGS ARTICLE | October 20, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Contamination, Air contamination, Molecules, Ions, Sulfur, Resistance, Surface roughness, Transmittance, Photomasks, Chemical analysis

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Oxides, Silica, Air contamination, Ions, Sulfur, Profiling, Photomasks, Scanning probe microscopy, Information operations, Industrial chemicals

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