Jongsu Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Thermal effects, Finite element methods, Photomasks, Chemical analysis, Beam shaping, Chemical reactions, Critical dimension metrology, Heat flux, Vestigial sideband modulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top