Jongsu Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Cadmium, Materials processing, Manufacturing, Photoresist materials, Process control, Directed self assembly, Plasma etching, Critical dimension metrology, Polymer thin films

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Etching, Image processing, Inspection, Control systems, Scatterometry, Process control, Measurement devices, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Scanners, Error analysis, Manufacturing, Distortion, Process control, Plasma enhanced chemical vapor deposition, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, Etching, Scanners, Critical dimension metrology, Neodymium, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Scanners, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top