Jongwook Kye
VP at Samsung Electronics Co., Ltd.
SPIE Involvement:
Senior status | Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author | Instructor
Publications (51)

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 23 May 2018

Proceedings Article | 26 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Sun, Optical proximity correction, High volume manufacturing, Silicon photonics, Current controlled current source

SPIE Conference Volume | 24 April 2017

Proceedings Article | 30 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

Showing 5 of 51 publications
Conference Committee Involvement (7)
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Showing 5 of 7 Conference Committees
Course Instructor
SC779: Polarization for Lithographers
The advent of ultra high numerical aperture (NA) systems enabled by immersion lithography has quickly brought polarization toward the top of the lithographer's list of concerns. A high index liquid between the resist and the last lens element allows better resolution by enabling larger angles of incidence, and thus more diffraction energy to couple into the resist. However various polarizing effects can become severe with these large angles of incidence. Most notably contrast from the TM component drops to near or below zero. Thus, the engineering of polarization states is becoming a necessary resolution enhancement technique. Consequently, understanding and controlling polarization throughout all components of the optical system become critical. This course provides the lithographer a basic knowledge of polarization and its application to high-NA imaging. After an introduction to the concept of polarization and the various ways it can be represented, both the benefits and limitations of its application to lithography are discussed. The polarizing effects of each component of the optical system are addressed, offering an understanding of their ultimate impact on imaging.
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