Dr. Joo-On Park
Project Engineer EUV at SUNY Poly SEMATECH
SPIE Involvement:
Publications (14)

Proceedings Article | 3 April 2010 Paper
C. Park, K. Kim, Y. Lee, K. Cho, J. Park, In Kim, J. Yeo, S. Choi, D. Lee, B. Lee, S. Hwang
Proceedings Volume 7637, 76371R (2010) https://doi.org/10.1117/12.846481
KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Electron beam lithography, Lithography, Line width roughness, Etching, Photomasks, Silicon, Optical lithography, Quartz

Proceedings Article | 20 March 2010 Paper
Kyoung-Yong Cho, Joo-On Park, Changmin Park, Young-Mi Lee, In-Yong Kang, Jeong-Ho Yeo, Seong-Woon Choi, Chan-Hoon Park, Steven Lange, SungChan Cho, Robert Danen, Gregory Kirk, Yeon-Ho Pae
Proceedings Volume 7636, 76361E (2010) https://doi.org/10.1117/12.846482
KEYWORDS: Semiconducting wafers, Photomasks, Line width roughness, Inspection, Wafer inspection, Scanning electron microscopy, Defect detection, Signal to noise ratio, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360K (2010) https://doi.org/10.1117/12.846922
KEYWORDS: Photomasks, Wafer inspection, Inspection, Particles, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Mask making, High volume manufacturing

Proceedings Article | 18 March 2010 Paper
Proceedings Volume 7636, 763604 (2010) https://doi.org/10.1117/12.846629
KEYWORDS: Optical lithography, Extreme ultraviolet, Manufacturing, Line width roughness, Polymers, Etching, Extreme ultraviolet lithography, Resistance, Glasses, Photoresist processing

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727142 (2009) https://doi.org/10.1117/12.813996
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Reflectivity, Scanners, Critical dimension metrology, EUV optics, Optical calibration, Cadmium

Showing 5 of 14 publications
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