Dr. Joo-On Park
Project Engineer EUV at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 3 April 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Quartz, Silicon, Photomasks, Line width roughness, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Defect detection, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, High volume manufacturing, Semiconducting wafers

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Signal to noise ratio, Defect detection, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 18 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Manufacturing, Resistance, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, EUV optics

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Light sources, Etching, Scanners, Resistance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Showing 5 of 14 publications
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