Dr. Joon-Min Park
at Hanyang Univ
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Photoresist materials, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Cadmium, Glasses, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Applied physics, Photoresist processing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Surface roughness, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Microfluidics, Optical lithography, Ultraviolet radiation, Physics, Double patterning technology, Immersion lithography, Nanoimprint lithography, Critical dimension metrology, Binary data

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Glasses, Photomasks, Extreme ultraviolet, Double patterning technology, Immersion lithography, Applied physics, Photoresist processing

Showing 5 of 9 publications
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