Joon-Soo Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 15 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Line edge roughness, Stochastic processes

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Electronics, Metrology, Optical lithography, Polarization, Calibration, Etching, Optical testing, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Logic, Deep ultraviolet, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Edge roughness

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Diffractive optical elements, Etching, Scanners, Optical testing, Optical metrology, Measurement devices, Semiconducting wafers, Wafer testing, Overlay metrology

Showing 5 of 15 publications
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